PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM,申请号EP20070710522-传众专利搜索

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发明名称	PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM
摘要
申请公布号	EP2002458(A1)	申请公布日期	2008.12.17
申请号	EP20070710522	申请日期	2007.03.16
申请人	IMS NANOFABRICATION AG	发明人	PLATZGUMMER, ELMAR
分类号	H01J37/04;H01J37/317	主分类号	H01J37/04
代理机构		代理人
主权项
地址

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