| 发明名称 |
|
| 摘要 |
|
| 申请公布号 |
JP4196203(B2) |
申请公布日期 |
2008.12.17 |
| 申请号 |
JP20040072681 |
申请日期 |
2004.03.15 |
| 申请人 |
|
发明人 |
|
| 分类号 |
B65H5/06;H04N1/00 |
主分类号 |
B65H5/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
您可能感兴趣的专利
Quaternary bis-ammonium salt precursors and their uses as prodrugs having an antiparasitic activity
MANUFACTURING METHOD OF CARBONACEOUS NEGATIVE ELECTRODE MATERIAL FOR NONAQUEOUS ELECTROLYTIC SOLUTION SECONDARY BATTERY
DOCUMENT MANAGEMENT APPARATUS, DOCUMENT MANAGEMENT METHOD, AND PROGRAM
METHOD FOR BLEACHING FIBER STRUCTURE
OPTICAL INFORMATION RECORDING MEDIUM AND MANUFACTURING METHOD OF THE SAME
VOLUME HOLOGRAM RECORDING PHOTOSENSITIVE COMPOSITION AND MANUFACTURING METHOD FOR VOLUME HOLOGRAM RECORDING MEDIUM USING SAME
AROMATIC POLYCARBONATE COPOLYMER AND OPTICAL DISC SUBSTRATE FORMED THEREOF
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
POSITIVE TYPE RESIST COMPOSITION FOR ELECTRON BEAM, X RAY OR EUV RAY, AND PATTERN FORMING METHOD USING SAME
LPP TYPE EUV LIGHT SOURCE APPARATUS
MANUFACTURING METHOD OF DIE FOR FORMING ANTIREFLECTION STRUCTURE, ANTIREFLECTION STRUCTURE, AND OPTICAL ELEMENT
FORMING METHOD OF HOLE PATTERN
MASK PATTERN DATA PRODUCING METHOD, PATTERNING METHOD, RETICLE CORRECTING METHOD, RETICLE MANUFACTURING METHOD, AND SEMICONDUCTOR APPARATUS MANUFACTURING METHOD
EXPOSURE METHOD AND EXPOSURE DEVICE
SEMICONDUCTOR WAFER AND ITS MANUFACTURING METHOD
VOLATILE MEMORY-CELL TRANSISTOR INCLUDING GATE DIELECTRIC FILM WITH CHARGE TRAP AND METHOD OF MANUFACTURING SAME
EXPOSING DEVICE AND POSITIONING METHOD
METHOD FOR PROCESSING IMAGE AND DEVICE FOR PROCESSING IMAGE
OPHTHALMOLOGY PHOTOGRAPHY APPARATUS
OPHTHALMOLOGIC PHOTOGRAPHING APPARATUS
