| 摘要 |
<p>In a process for coating a substrate by vacuum evapn. and condensn., an electron beam is directed into a localised zone of a cooled holder carrying the material (I) being evaporated, and relative motion is applied between the beam and the holder so that (I) travels through the localised heating zone, the speed and beam-energy being correlated so virtually all (I) is evaporated; and the substrate is located in the path of the vapour. The electron beam is pref. stationary and (I) carried through the beam at a prescribed, uniform speed. (I) pref. consists of finely-divided particles fed onto the cooled holder. Used e.g. for the vapour deposition of materials onto substrates which are sensitive to heat, such as glass or plastic substrates.</p> |
