PROCEDE POUR DEPOSER DES REVETEMENTS DIFFERENTS CONTIGUS JOINTIFS SUR UN SUBSTRAT TRANSPARENT ET PRODUITS OBTENUS

摘要

1485097 Photo-resist process BALZERS PATENT-und BETEILIGUNGS AG 23 Dec 1975 [7 Jan 1975] 52523/75 Heading G2X Two coatings in the form of adjacent comp lementary images are formed on a substrate surface by (1) forming a coating of first material on the desired areas of the substrate surface; (2) applying a layer of positive-working photo-resist over both the first coating and the uncoated parts of the surface; (3) exposing through the substrate, the first coating being substantially opaque to the radiation used; (4) developing to remove the exposed areas of the photo-resist layer (i.e. those areas not on the first coating); (5) applying the second coating and (6) removing the remaining photo-resist layer together with the parts of the second coating thereon.