| 发明名称 |
Photosensitive copolymer on silicon support |
| 摘要 |
Copolymers of certain keto-olefins and SO2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
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| 申请公布号 |
US4054454(A) |
申请公布日期 |
1977.10.18 |
| 申请号 |
US19760659976 |
申请日期 |
1976.02.20 |
| 申请人 |
RCA CORPORATION |
发明人 |
HIMICS, RICHARD JOSEPH;GRAHAM, SCOTT OLIVER;ROSS, DANIEL LOUIS |
| 分类号 |
G03F7/039;(IPC1-7):G03C1/68;G03C5/00 |
主分类号 |
G03F7/039 |
| 代理机构 |
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