发明名称 MANUFACTURING PROCESS OF THICK FILM RESISTANCE
摘要 <p>PURPOSE:To intend to improve heat resistant property of thick film resistance, by using amorphous glass flit whose softening temperature is a specified temperature value. CONSTITUTION:Amorphous glass whose softening point is 700-850 deg.C is ground, and glass flit whose particle diameter is under about 3mu, for example, is prepared. This glass flit and electro-conductive component are mixed, furthermore, vehicle in which ethyl-cellulose is solved in alpha-terpineol is added, and they are kneaded and are made as paste. Thick film resistance is formed by painting such that an electrode that is formed on an insulating base plate is connected by paste and then burning it at the temperature which is over 150 deg.C than softening point of glass flit. Such thick film resistance has excellent heat resistant property, and it can load electric power of over twice, compared with former resistance.</p>
申请公布号 JPS5444798(A) 申请公布日期 1979.04.09
申请号 JP19770110548 申请日期 1977.09.16
申请人 HITACHI LTD;TANAKA MASSEY KK 发明人 YOSHINO YOSHI;IWANAGA SHIYOUICHI;SUGISHITA NOBUYUKI;WATANABE YOSHINOBU
分类号 H01C17/06;B41J2/335;B41M5/26;H01C7/00;H01C17/30 主分类号 H01C17/06
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