| 摘要 |
PURPOSE:To prevent the peeling of resist at contact exposure with a hard mask by using the hard mask (metal vapor deposition mask) comprising covering its pattern surface with the specific protecting film. CONSTITUTION:A protection resin film 3 of film thickness about 5000Angstrom is formed with mask-protecting resin which is transparent and has cushioning characterstic (e.g., polyvinyl alcohol) on the hard mask comprising forming mask patterns 2 by Cr, Cr2O3, Fe2O3, etc. on one surface of a glass plate 1, after which plasma etching in methane tetrafluoride is applied by using a plasma etching device, whereby the portions 4 where the resin and fluorine have chemically bonded are formed on the surface layer of the protecting resin film 4. The hard mask having the protecting film such as the abovementioned one has cushioning characteristic at the time of contact exposure and has no adhesiveness to resist, resulting in considerably reduced peeling of resist. |
