| 摘要 |
<p>Negative x-ray resists useful in the production of high-resolution patterned images. The x-ray resist contains a mixture of poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate), with the latter forming between 1 percent and 20 percent by weight, of the total polymer mixture. This ray resist has adhesive and resolving properties superior to those of poly(2,3-dichloro-1-propyl acrylate). Superior properties of the mixture are attributed to the fact that the two polymers form a compatible polymer mixture which is a relatively rare and unpredictable event in polymer chemistry. </p> |
