| 摘要 |
PURPOSE:To perform high-speed and highly accurate lithography by preventing the drift of a blanking-plate voltage when an electron beam is ON, by using a blanking circuit having a constitution wherein switching element is not conducted except the transient period. CONSTITUTION:When a positive-voltage signal is input to the base of a transistor 15, a FET14 is turned on, a FET12 is turned off, a FET13 is turned on, and the electric charge stored in blanking plates 3 is discharged through the FET13. The potential of the blanking plates becomes the ground potential, and an electron beam 2 becomes on. At this time, the FET13 is on, but the current is not flowed at all. When the base of the transistor 15 is grounded, FET14 is turned off, the FET12 is turned on, the FET13 is turned off, the voltage of the blanking plates 3 increases to the voltage Vcc, and the beam 2 becomes off. At this time, the current is not flowed in the FET12 at all. In this constitution, the drift of the electron beam due to the blanking circuit s prevented, and high-speed and highly accurate lithography can be performed. |
