发明名称 MANUFACTURE OF SEMICONDUCTOR LASER
摘要 PURPOSE:To improve characteristics and the yield of manufacture, by using a substrate having a groove along a portion to be a waveguide. CONSTITUTION:A groove 32 is provided on an N type GaAs substrate 11. At least two continuous semiconductor layers are made on the surface of the substrate 11 having the groove 32, thereby changing the groove into a flat surface. Both the semiconductor layers on the band groove 32 are then removed by mesa etching so that at least a part of the semiconductor layers is left. After both continuous semiconductor layers exposed to at least mesa-etched sides are covered with a new semiconductor layer, the substrate is cleft perpendicularly to the longitudinal direction of wide part 322 of the groove 32.
申请公布号 JPS5636184(A) 申请公布日期 1981.04.09
申请号 JP19790111364 申请日期 1979.08.31
申请人 NIPPON ELECTRIC CO 发明人 MATSUMOTO YOSHINARI;IDE YUUICHI
分类号 H01L21/208;H01L33/10;H01L33/14;H01L33/30;H01S5/00;H01S5/16 主分类号 H01L21/208
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