| 摘要 |
PURPOSE:To detect the etching status of an insulating film by using etchants soaked with the insulating film and resist film but will not be soaked with a semiconductor substrate wherein the soaked status of the etchants is visually observed. CONSTITUTION:A photoresist 3 is provided on a semiconductor substrate 1 having an insulating film 2 for patterning to consist the photoresist 3 as a mask. And in etching the insulating film 2 by etchants (an aqueous solution of hydrofluoric acid group) soaked with the insulating film 2 and resist film 3 but will not be soaked with the semiconductor substrate 1, etching status (When the etching has been completed, the etchants will not exist at an opening 6) is detected by visually observing the leakage status of the etchants 4 after pulling the substrate 1 out of the etchants. In this way, the completion of etching can visually by confirmed. Therefore, an etching process will be simplified. |
