| 摘要 |
<p>A method for the plasma hydrogenation of SiCl4. A high pressure plasma (16) is utilized to effect a reaction of H2 (44) and SiCl4 (42) to form HSiCl3 and other hydrogenated silicon chlorides which can be separated from H2 and HCl by-product by passing the output gases from reactor (50) to condensation apparatus (56). </p> |
