| 摘要 |
PURPOSE:To automtically inspect the propriety of resolution by forming blank and residual patterns of the same size on a mask, taking the formed resist image, treating a single and evaluating the pattern size ratio and its stability. CONSTITUTION:Blank pattern 19 of microminiature sizes e, f, where a negative resist is used, and a residual pattern 15 are formed as an inspection at one or plural positions on a mask, and the resist layer on the wafer 24 is exposed and developed. The bright field image of this resist pattern is taken by a TV camera 23, and a signal is processed to express the reflection light signal produced from the step of the pattern edge to be expressed, for example, by time intervals k, i for the sizes of the respective patterns. When the resist pattern is suitably processed, the ratio of k or i becomes approximately 1, bur when the pattern is improper, the difference of the k and i becomes large and unstable, thereby automatically inspecting the propriety of the resolution. |
