| 摘要 |
PURPOSE:To vapor deposit an evaporating material easily on a vapor deposition substrate in spite of the case when it is difficult to apply voltage to said substrate by applying voltage to a case for the evaporating material in a vacuum vapor depositing device. CONSTITUTION:A vapor deposition substrate 4 from an un-coiling section 1 contacts a cooling can 1, after which it goes toward a coiling section 3. A case 9 contg. an evaporating material 10 is insulated from the ground and is connected to an electric power source 11. An electrode 12 controlling electric field is provided around said case by being connected to an electric power source 13. The electrons scattering from a heater 6 are accelerated by an electrode 7 to electron rays 8 which enter the material 10 in the case 9. The material 10 ionized and charged positive by the positive voltage applied to the case 9 is accelerated to arrive at the surface of the cooling can 1, thereby forming an evaporating material 5 on the substrate 4. The electrode 12 is maintained at positive potential to improve the efficiency of vapor deposition. Thereby, the materal 10 is vapor-deposited easily on the substrate 4. |
