| 摘要 |
PURPOSE:To prevent an adverse influence to be generated by heat in the impurities introducing region for element formed in a substrate, etc., by a method wherein previous heating of the substrate to be performed with laser annealing is conducted by a laser beam. CONSTITUTION:The laser beam LA for annealing is reflected by a mirror M, and is condensed by a lens G1 to perform scanning on the substrate S in the X direction. The laser beam LH for previous heating is condensed by a lens G2, and irradiates the substrate S from the oblique direction. The diameter of the previously heating spot of the beam LH is larger than the diameter of the annealing spot of the beam LA, and the previously heating spot procedes the annealing spot. Accordingly although annealing is performed as the same with the case when the whole of the substrate S is previously heated, but because previous heating is performed locally, the part other than the part necessitating annealing is not heated, and all regions formed already are not affected by adverse influence. |
