发明名称 MECHANISM FOR DETECTING SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To minimize influences of disturbance by a mechanism wherein a shield plate driven to be swung by virtue of weight of a semiconductor substrate is disposed between a light source and a photodetector, so that an optical path is opened and closed by the swing motion of this shield plate to detect the presence or absence of the semiconductor substrate. CONSTITUTION:The mechanism comprises a light source 1, a photodetector 2, a shield plate 3 which interrupts an optical path between the light source 1 and the detector 2 and which is easily driven to be swung by virtue of weight of a wafer, and a rotary shaft 4 for the shield plate 3. An integrated photointerrupter is used as the light source 1 and the photodetector 2. The optical path between the light source 1 and the photodetector 2 is normally interrupted by the shield plate 3. When a wafer 6 is placed on a base 5 of this detection mechanism or passes over the base 5, the shield plate 3 is driven to be swung by virtue of weight of the wafer 6 in the clockwise direction (as indicated by arrows in the figure), thereby to open the optical path.
申请公布号 JPS5821840(A) 申请公布日期 1983.02.08
申请号 JP19810121149 申请日期 1981.07.31
申请人 NIPPON DENKI KK 发明人 AMAI HIDEMI
分类号 H01L21/67;G01R31/26 主分类号 H01L21/67
代理机构 代理人
主权项
地址