| 摘要 |
PURPOSE:To eliminate photosensitive residual and to improve resolution by first treating the photosensitive material of cyclized rubber system negative type with a developer having a strong developing power, and then treating it with a high resolving power developer after the photosensitive material coating and exposing. CONSTITUTION:A material to be etched formed on the main surface of a semiconductor substrate is coated with the photosensitive material of cyclized rubber system negative type, which is subjected to soft baking, and after cooling it is then exposed with a photo mask positioned on it. After the exposure, treatment is made first with a developer made from aromatic monocyclic hydrocarbon, such as xylene, having a strong developing power to the photosensitive material, then with a developer made from naphtha or one kind of aliphatic hydrocarbon having a good resolving power. After the development rinse is made with acetic ester, etc., hard baking is applied and finally the material to be etched is subjected to etching treatment. |
