| 摘要 |
PURPOSE:To sharpen a pattern on a wafer, by using quartz glass contg. a specified amt. of titanium oxide. CONSTITUTION:Quartz glass contg. 20-5,000ppm titanium oxide (TiO2) is used as the glass mask substrate. It absorbs most of far UV rays of <=220nm wavelengths, resulting in exposing the wafer to 220-300nm wavelength light. Since the wavelength region ranging over the far UV rays is narrowed, the pattern formed on the wafer is made sharper. |
