| 摘要 |
PURPOSE:To equalize annealing characteristics in the lateral direction by a method wherein a plurality of annular infrared lamps are arranged in parallel on the same axis, the other circumference of these lamps is covered with a reflector combining a support member for the lamps, a wafer supporter is disposed in the space, while service currents and service time to the lamps are controlled and a heating temperature is adjusted. CONSTITUTION:A plurality of doughnut-shaped infrared lamps 11 are arranged on the same axis under the state in which they are brought mutually into contact, the outer circumference of the lamps 11 is covered with a shell 12 for supporting the lamps combining the reflector while axial ends are closed, and the space 11a generated is used as an annealing space. The device is constituted in this manner, the supporter 14 supporting Si wafers 13 in a predetermined attitude is inserted from one end surface in an insertion and removal-free shape, and the annealing space 11a is brought to a vacuum state by using a vacuum pump 15. A temperature sensor 17 is provided the space 11a, and service power and service time to the lamps 11 are controlled by using an output from the sensor. |
