| 摘要 |
Doped SiO2 glass is made by subjecting an easily oxidisable SiO2 cpd. to thermal oxidn. or flame hydrolysis to form SiO2 glass fine particles; dissolving a dopant oxide into the particles by oxidising a gas which forms doped SiO2 on the particle surfaces; and sintering to vitrify the particles. (I) pref. comprises an oxidisable Si cpd.; an oxidisable dopant precursor; and water vapour or O2. The doped SiO2 glass is pref. formed at 500-1200 deg.C, 500-1000 deg.C in the case of thermal hydrolysis and 800-1200 deg.C in the case of thermal oxidn. Used in prodn. of optical fibre preforms. Pref. the doped SiO2 glass particles are deposited and sintered on a rotating starting material, the rotating axis of which is inclined at 5-90 deg. to the blow-off direction. |
