发明名称 Process for producing light sensitive lithographic plate requiring no dampening solution
摘要 A process for producing a light-sensitive lithographic plate requiring no dampening solution comprising (1) carrying out corona discharge treatment on the surface of a silicone rubber layer of a light-sensitive lithographic plate requiring no dampening solution wherein the silicone rubber layer is the top layer, (2) spraying a solution or dispersion containing a non-volatile solid component on said silicone rubber layer, and (3) drying to provide fine projection patterns on said silicone rubber layer.
申请公布号 US4590148(A) 申请公布日期 1986.05.20
申请号 US19850710892 申请日期 1985.03.12
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TAKAHASHI, HIROSHI;TAMAKI, HIROYUKI;OHISHI, CHIKASHI;SHIBA, KEISUKE
分类号 G03F7/00;G03F7/075;G03F7/115;(IPC1-7):G03F7/02;G03C5/00 主分类号 G03F7/00
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