发明名称 |
Process for producing light sensitive lithographic plate requiring no dampening solution |
摘要 |
A process for producing a light-sensitive lithographic plate requiring no dampening solution comprising (1) carrying out corona discharge treatment on the surface of a silicone rubber layer of a light-sensitive lithographic plate requiring no dampening solution wherein the silicone rubber layer is the top layer, (2) spraying a solution or dispersion containing a non-volatile solid component on said silicone rubber layer, and (3) drying to provide fine projection patterns on said silicone rubber layer.
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申请公布号 |
US4590148(A) |
申请公布日期 |
1986.05.20 |
申请号 |
US19850710892 |
申请日期 |
1985.03.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAKAHASHI, HIROSHI;TAMAKI, HIROYUKI;OHISHI, CHIKASHI;SHIBA, KEISUKE |
分类号 |
G03F7/00;G03F7/075;G03F7/115;(IPC1-7):G03F7/02;G03C5/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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