| 摘要 |
PURPOSE:To contrive mass production by enabling characteristic check and coating with the protection film before substrate separation by a method wherein a substrate having a device constituting the laser is provided with grooves deeper than the active layer in the direction of Fabry-Perot reflection surface formation, and the necessary part of a groove is irradiated with ion beams, thus forming a Fabry-Perot reflection surface. CONSTITUTION:The laser structure is constructed by successively forming an Al GaAs lower clad layer 21, a P type Al GaAs upper clad layer 22, a current restriction layer 23, a P type Al GaAs upper clad layer 4, and a P<+> type GaAs caps layer 25 on an N type GaAs substrate 10; then, a P type electrode 50 and an N type electrode 51 are provided. The uppermost layer is coated with a photo resist 30 except at the part of forming the Fabry-Perot (FP) reflection surface of the substrate 10, and grooves 40 deeper than the active layer 21 are formed by dry etching with a width of 10mum or more. FP reflection surfaces 42 are formed by scanning the necessary part of the grooves 40 with ion beams. After characteristic check, a protection film is provided, and the bottom 41 of the groove 40 is separated with a dicer or the like.
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