发明名称 FORMING METHOD FOR DEPOSIT-FILM
摘要 PURPOSE:To improve reproducibility in film formation and the quality of a film by introducing a specific compound as a raw material for shaping a deposit film and an active species chemically reacting with the compound into a film forming space for forming the deposit film onto a base body. CONSTITUTION:When shaping a deposit-film having desired functionality, the quantities of introduction of a compound (A) represented by formula employed for introduction and an active species chemically reacting with the compound (A), the temperatures of a base body and in a film forming space and inner pressure in the film forming space are used as formation parameters for the deposit-film. m represents a positive integer equal to the valence of R and n a positive integer equal to the valence of M in formula. M represents an element belonging to the II group after the second period of the periodic table, an element belonging to the III group, the V group or the VI group after the third period or an element belonging to the IV group after the fourth period and R a hydrocarbon group. Accordingly, the formation of the deposit-film is controlled easily, and the deposit-film with functionality having reproducibility and mass productivity can be shaped.
申请公布号 JPS61222113(A) 申请公布日期 1986.10.02
申请号 JP19850028794 申请日期 1985.02.16
申请人 CANON INC 发明人 ISHIHARA SHUNICHI;ONO SHIGERU;KANAI MASAHIRO;ODA TOSHIMICHI;SHIMIZU ISAMU
分类号 H01L31/04;C23C16/20;C23C16/50;H01L21/205;H01L21/28 主分类号 H01L31/04
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