| 摘要 |
PURPOSE:To provide a hard carbon film-coated tool which can finish a finished work to a high grade with small machining resistance and less damage on the tool by forming a hard carbon film consisting of mixed crystals of diamond and graphite on the surface of the tool material. CONSTITUTION:The above-described carbon film is formed by, for example, a plasma CVD method. More specifically, a base plate 3 is set to a base plate holder 2 in a vacuum vessel 1 and after the inside of the vessel 1 is adjusted to a prescribed degree of evacuation, gaseous Ar plasma is formed between a filament 7 for emitting electron and an electrode 6 for maintaining discharge. A negative high voltage is then impressed to the plate 3 by a high-voltage power source 4 and the plate 3 is subjected to sputter cleaning by Ar<+>. Gaseous C2H4 is introduced 10 into the vessel and the gaseous pressure is set at about 1<-3>Torr and thereafter C2H4 plasma is formed between the electrode 6 and the filament 7. A negative high voltage (-2--3.5kV) is impressed on the plate 3 then a shutter 5 is opened to form a hard carbon film consisting of mixed crystals of diamond and graphite on the plate 3, by which the hard carbon film-coated tool is obtd. |
