发明名称 DISTRIBUTED INDEX ANAMORPHIC PLANE MICROLENS AND ITS MANUFACTURE
摘要 PURPOSE:To collimate an elliptic beam emitted by a semiconductor laser and to facilitate the manufacture of a lens by forming a semi-elliptic distributed index area which has a long and a short axis on the surface of a transparent substrate in the transparent substrate. CONSTITUTION:The semi-elliptic distributed index area 8 formed in the plate type transparent substrate 7 has its refractive index distribution formed so that the refractive index is highest in the center of the semi-elliptic body and decreases with the radius. The optical axis 9 is on a straight line running in the center of the elliptic hemisphere at right angles to the substrate and the focal length of the distributed index area is longer in the long-axis direction (X than in the short-axis direction (Y). This microlens has the semi-elliptic distributed index area formed by fitting a mask which has an elliptic aperture part in a predetermined shape on the surface of a plate glass body and then performing an ion exchange between ions which provides a high refractive index and alkali ions in the glass body through the aperture part.
申请公布号 JPS61275710(A) 申请公布日期 1986.12.05
申请号 JP19850116347 申请日期 1985.05.31
申请人 HOYA CORP 发明人 SAKAI HIROYUKI;ASAHARA YOSHIYUKI;OMI SHIGEAKI;NAKAYAMA SHIN;YONEDA YOSHITAKA
分类号 C03C21/00;G02B3/00;G02B9/00;G02B13/08 主分类号 C03C21/00
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