| 摘要 |
PURPOSE:To miniaturize and lighten the titled apparatus, and to shorten the processing time by a method wherein an exposure-beam generator is loaded on a carriage and constituted in a movable manner, a drive mechanism is divided into two sections centering around a wafer and the two sections are used as a fist moving means shifting a head and a second moving means transferring the heat at approximately a right angle to the first moving means. CONSTITUTION:A wafer WF is sucked to a water chuck WC, and shifted in the vertical (Y direction) direction. A carriage CA is guided by shafts G1, G2, and moved continuously by ropes LP in the (x) direction. The movement of these wafer and carriage is controlled by a laser interferometer LZ. An exposure-beam generating head EH, light source LER, LEL and light-receiving elements CDR, CDL are mounted to a support plate YS. The electrostrictive element of piezoelectricity, etc. is fitted to the support plate YS, the head EH and the light-receiving elements LER, LEL, etc., are transferred vertically along guide grooves by driving the electrostrictive element, and the position of the head in the Y direction is corrected. The electrostrictive element mounted to a shaft ZS shifts the head EH, and corrects the position of the head in the Z direction-that is, conducts focusing. A shaft Gtheta functions as a shaft for correcting the direction of rotation (theta) of the head EH.
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