| 摘要 |
PURPOSE:To form a sharp and precise pattern on a substrate by pressing the intermediate part of a mask by a set spring to the substrate in tight contact therewith and positioning the set spring in a manner as not to hinder particles for vapor deposition. CONSTITUTION:The substrate 7 fixed to a substrate frame 6 is pressed by means of positioning pins 2 and receiving pins 3 onto the mask 5 for film formation which is fixed to a mask frame 1 and on which a pattern is formed. One end of the set spring 10 is attached to the mask frame 1 by means of a screw 11 and the other end of the set spring 10 is bent to press the intermediate part of the mask 3 to the substrate 7 in tight contact therewith. The space between the transverse side 10a of the set spring 10 and the film forming part of the substrate is so determined as to be made >=4 times the diameter or width of the set spring 10. The sharp and precise pattern is thereby formed onto the substrate 7 even if the incident angle of the film forming material on the substrate 7 increases.
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