发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To improve setting characteristics of a photocrosslinking polymer by using a specified sensitizer. CONSTITUTION:A photosensitive resin compsn. consists of an optically insolubilized diazo compd., an optically crosslinked alkali-soluble polymer having an unsatd. group in the side chain, a crosslinking agent, benzoin, 4,4'- dimethylamino benzophenone, 2-ethyl anthraquinone, thiolic acid or a deriv. thereof. The photosensitive resin compsn. is coated generally in the form of soln. on an Al plate, Zn plate, or other multilayered lithographic metallic plate. The coating is executed with a whirler, curtain coater, or a roll coater, etc., for sheet coating or web coating. The photosensitive lithographic plate material can be printed and developed with the similar process as an ordinary lithographic plate. Arc lamp, mercury lamp, chemical lamp, etc., may be used as the source of the activating rays. The processing process comprises a stage for exposure, for development, for washing with water, and for drying. Thus, a printing plate for offset printing is prepd.
申请公布号 JPS62226146(A) 申请公布日期 1987.10.05
申请号 JP19860067786 申请日期 1986.03.26
申请人 NIPPON FOIL MFG CO LTD 发明人 YOKOTA YUZO;KIMURA KEIICHI
分类号 C08F2/50;C08K5/23;C08L101/00;G03C1/00;G03F7/004;G03F7/021;G03F7/031;G03F7/038 主分类号 C08F2/50
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