| 摘要 |
A spin drying apparatus for drying semiconductor wafers (32) wherein the wafers are contacted only at the edge thereof by a plurality of radially extending arms (122) and wherein means (200, 202) is provided for preventing the generation of turbulent air flow by the fan-like effect of the rotation of the arms during the spin drying step and the recontamination of already cleaned and dried wafer surfaces by contaminants stirred up by the operation of the spin drying apparatus itself. |
