发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To fabricate a large-sized flat target of specified dimensions and shape by connecting plural small sections having the same composition when the large-area target for sputtering consisting of a brittle intermetallic compd. is fabricated. CONSTITUTION:Small pieces 101-104 of the extremely brittle target for a magneto-optical recording body consisting of an intermetallic compd. having the composition formula shown by (LRXHR1-X)YTM1-Y-ZAZ and forming a magneto-optical recording medium are bonded on a packing plate 105 to fabricate a large-area target for rare earth element-transition metal series metallic compd. planar magnetron sputtering. In the formula, LR is the one kind among light rare-earth metals such as Sm, Nd, Pr, and Ce, TM is the one kind among transition metals such as Fe, Co, and Ni, A is the one kind among Cr, Ti, Al, and Zr, and 0.1<=X<=0.4, 0.2<=Y<=0.5, and 0<Z<0.1.
申请公布号 JPS6335769(A) 申请公布日期 1988.02.16
申请号 JP19860177978 申请日期 1986.07.29
申请人 SEIKO EPSON CORP 发明人 YAMAGISHI TOSHIHIKO;FUNADA SHIN;INAZUMI MITSUHIRO;SHIMOKAWATO SATOSHI
分类号 C23C14/34;G11B11/10;G11B11/105;H01F41/18 主分类号 C23C14/34
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