METHOD FOR FORMING DRY-ETCHING-POSSIBLE MULT-LAYER RESIST USING GRAFT POLYMERIZATION BY ELECTRON BEAM,申请号KR1019850010131-传众专利搜索

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发明名称	METHOD FOR FORMING DRY-ETCHING-POSSIBLE MULT-LAYER RESIST USING GRAFT POLYMERIZATION BY ELECTRON BEAM
摘要
申请公布号	KR1019880001954(B1)	申请公布日期	1988.10.04
申请号	KR1019850010131	申请日期	1985.12.31
申请人		发明人
分类号		主分类号
代理机构		代理人
主权项
地址

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