发明名称 FORMATION OF ALLOY FILM BY CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE:To form a desired dense alloy film having superior uniformity and adhesion by plating the surface of a substrate with one of the constituent components of the alloy to a prescribed thickness, depositing the remaining component by chemical vapor deposition and carrying out the counter diffusion of the components. CONSTITUTION:The surface of a substrate of carbon steel or the like is plated with one of the constituent components of an alloy, e.g., Ni to a prescribed thickness. The remaining component, e.g., Ti id deposited on the resulting film by chemical vapor deposition and the components are alloyed by counter diffusion. Thus, a dense alloy film having a uniform compsn. can easily be formed. This method is effective in the formation of a film of an alloy whose constituent components are difficult to separately vaporize and deposit.
申请公布号 JPS63243274(A) 申请公布日期 1988.10.11
申请号 JP19870076793 申请日期 1987.03.30
申请人 AGENCY OF IND SCIENCE & TECHNOL 发明人 SHIKADA YORIO;UMEZAWA AKIHIKO;SAITO TETSUO
分类号 C23C16/02;C23C16/06;C23C16/28 主分类号 C23C16/02
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