| 摘要 |
<p>PURPOSE:To obtain a photomask with which the exfoliation of light shielding films is prevented and the chipping of a mask pattern hardly arises by providing a light transmissive protective film covering the light shielding films on the surface of the light shielding films of the photomask formed by providing the light shielding films forming the mask pattern on a light transmissive mask substrate. CONSTITUTION:Plural metallic films 2 which are the light shielding films are embedded into the upper part of the mask substrate 1. These metallic films 2 form the mask pattern and act to shut off light for exposing such as UV rays projected on the mask substrate 1. A light transmissive SiO2 film 3 which is the protective film is provided on the mask substrate 1 and the metallic films 2. The thickness of the SiO2 film 3 is preferably about 30-300nm. The function to protect the metallic films 2 degrades if the film is too thin and the accuracy of the pattern transfer degrades if the film is too thick. The light shielding films provided on the mask substrate are thus protected by the protective film, by which the chipping by the exfoliation of the light shielding films is prevented and the life is prolonged.</p> |
