| 摘要 |
PURPOSE:To realize a fine amorphous solar cell having high yield by depositing a transparent conductive film while being insulated from an effective generating region formed in the outer circumference of a light-transmitting insulating substrate on the inside of the outer circumference and depositing an amorphous silicon layer onto the whole surface. CONSTITUTION:A section 2 required for outputting power and a transparent conductive film 4 insulated from the periphery of the section 2 are deposited onto a light-transmitting insulating substrate 1 through vacuum deposition, and a P-type amorphous silicon layer 5, an I-type amorphous silicon layer 6 and an N-type amorphous layer 7 are deposited successively extending over the whole surface through glow discharge without a metallic mask. The transparent conductive film 4 and the amorphous silicon each layer 5-7 in a peripheral section are scribed and cut simultaneously by a glass cutter, thus cutting out separate amorphous solar cell 10. Accordingly, the adhesive properties of the amorphous silicon layers in the periphery of the substrate can be improved and no metallic mask is also required, thus easily manufacturing the low-cost amorphous solar cells having excellent yield and high reliability. |
