发明名称 ELECTROLESS COPPER PLATING SOLUTION
摘要 PURPOSE:To enhance the mechanical properties of a formed plating film such as the elongation and tensile strength by adding inositol to an electroless copper plating soln. contg. alpha.alpha'-dipyridyl. CONSTITUTION:About 50-1,300mg/l inositol is added to an electroless copper plating soln. contg. a cupric salt, a complexing agent, a reducing agent, alkali hydroxide and alpha.alpha'-dipyridyl. A plating film deposited from the plating soln. has superior elongation and tensile strength, so a printed circuit board having high reliability can be produced by using the plating soln.
申请公布号 JPH01205082(A) 申请公布日期 1989.08.17
申请号 JP19880029727 申请日期 1988.02.10
申请人 IWATSU ELECTRIC CO LTD 发明人 NAGASAWA KENJI;YACHI KANEO;KAKU KENJIRO
分类号 C23C18/40 主分类号 C23C18/40
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