| 摘要 |
<p>In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, d) from 0.001 to 10% by weight of one or more photoinitiators and e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.</p> |
