发明名称 LITHOGRAPHY MASK STRUCTURE
摘要 <p>PURPOSE:To prevent a protective film from being separated owing to any external factor by tightly sticking a lithography mask holding film utilizing a slanting portion extending in a direction of the outer circumference of a support frame and a groove part both provided on and in a partial region of an annular end of the support frame. CONSTITUTION:A slanting part 1a slanting in an outer circumferential direction of a support frame 1 is formed on an outer circumferential end portion of the support frame 1, and a flat surface part 7 polished into a fine plane is formed on a partial region of an annular part. A holding film 2 is extended tightly and pressurized between the flat surface part 7 and the slanting part 1a so as to make contact therewith, and an adhesive 5 applied on the slanting part 1a is hardened. Thereafter, an outer circumferential part of the holding film 2 is cut and shaped along the outer circumferential part of the support frame 1 into a length thereof such that it is buried in a groove part 3. Then, after an adhesive 4 is poured into the groove part 3 to a depth half the groove part 3, the outer circumferential part of the holding film 2 is inserted into the groove part 3, which is then filled with the adhesive 4. Thus, the holding film 2 is fixed to the support frame 1. Hereby, the holding film 2 is prevented from getting out of place or being separated.</p>
申请公布号 JPH01266723(A) 申请公布日期 1989.10.24
申请号 JP19880095323 申请日期 1988.04.18
申请人 CANON INC 发明人 FUKUDA YOSHIAKI;SUZUKI YUMIKO
分类号 H01L21/027;H01L21/30 主分类号 H01L21/027
代理机构 代理人
主权项
地址