发明名称 PHOTO-SETTING COMPOSITION
摘要 PURPOSE:To obtain the title composition which has a reduced cure shrinkage and can form a coating film excellent in adhesiveness to base material, surface hardness, and abrasion resistance, by mixing a silicone-modified acrylic polymer, an alpha,beta-unsaturated carboxylic acid, a colloidal silica, and a photopolymerization initiator. CONSTITUTION:A photo-setting composition is obtained by mixing 100pts.wt. silicone-modified acrylic polymer (A) comprising a copolymer of a radical- polymerizable acrylate monomer of formula I [wherein X1 is H or lower alkyl; X2 is H or an (un)substituted aliphatic or cyclic hydrocarbon residue having a valence of n; n is 1-4] with an acryloxy-functional silane of formula II (wherein X3 is H or lower alkyl; X4 is a divalent hydrocarbon group; X5 is a monovalent hydrocarbon group), 10-200pts.wt., preferably 20-130pts.wt., alpha,beta-unsaturated carboxylic acid compound (B) preferably comprising acrylic acid or an ester thereof, 1-100pts.wt., preferably 5-50pts.wt., colloidal silica (C) (preferably dispersed in a lower alcohol), and 0.1-10pts.wt. photopolymerization initiator (D).
申请公布号 JPH01266155(A) 申请公布日期 1989.10.24
申请号 JP19880094928 申请日期 1988.04.18
申请人 SUNSTAR ENG INC 发明人 SAKUMA AKIRA;OKAMOTO HIROSHI;KADOWAKI TOSHIO
分类号 C08L33/14;C08F2/44;C08F2/48;C08F2/54;C08K3/36;C08K13/02;C08L33/04;C08L33/06;C08L43/00;C08L43/04;C09D4/00;C09D4/02;C09D133/06;C09D137/00;C09D143/04 主分类号 C08L33/14
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