| 摘要 |
PURPOSE:To prevent the generation of microcracks by constituting the antireflection film of a 1st layer and 2nd layer having respectively specific optical film thicknesses and consisting of SiO2, the 3rd layer consisting of CeO and the 4th layer consisting of SiO2. CONSTITUTION:The 1st layer 2 consisting of the SiO2 is formed on the surface of a synthetic resin substrate 1; the 2nd layer 3 consisting of the CeO is formed on the 1st layer 2, and the 4th layer 5 consisting of the SiO2 is formed on the 2nd layer 3. The optical film thicknesses of the 1st layer, the 2nd layer, the 3rd layer and the 4th layer are respectively 0.06-0.125lambda, 0.043-0.125lambda, 0.06-0.625lambda, and 0.165-0.34lambda. The generation of the microcracks is obviated even after a thermal impact test while the improved adhesiveness and the low spectral reflectivity are maintained. The antireflection film of the optical parts made of the synthetic resin having good appearance and performance is thus obtd. |
