Process for the manufacture of a sputtering target for producing electroconductive transparent films.

摘要

A sputtering target for producing electroconductive transparent films, which comprises indium oxide and tin oxide and having such a shape that not less than 80% by weight of the target is present in an erosion area on sputtering, and the process for manufacturing the sputtering target which comprises molding a slurry or a powder mixture containing indium oxide and tin oxide into a molded shape and sintering the molded shape.