| 摘要 |
PURPOSE:To provide a perfect mirror face free of orange peel etc. without bringing about strains at the processing surface, by adjusting the polishing pressure in the position of a base board due to turning round own axis of a holder, and making constant the floating amount of the base board from the surface of a polishing tray. CONSTITUTION:Besides axis-symmetrical load, an eccentric load toward the center of a polishing tray 11 is applied to a base board 1 by a weight 6 fixed to a cross rod 5. Consequently the pressure applied to the surface of the base board 1 is greater near the center of the polishing tray 11, reducing toward the perimeter. At this time, an eccentric loading mechanism refrains from rotating even though a holder 2 turns round its own axis, so that an eccentric load 15 is applied at all times at the center of the polishing tray 11. Thus the distance of the base board 1 from polishing tray 11 (amount of floating) is held minimum by adjusting the polishing pressure applied to the base board 1 according to the position of the polishing tray 11, and the surface of the base board 1 is polished into a perfect mirror face with no strains. |
