发明名称 FORMATION OF ALIGNMENT MARKER OF COMPOSITE SUBSTRATE
摘要 PURPOSE:To easily align a groove with a marker and to enhance an accuracy by a method wherein a thin film for alignment marker use is formed so as to expose one part of the groove, as a reference of an alignment operation, in a composite substrate whose groove in a pattern formation face has been filled with a different kind of material. CONSTITUTION:A mask evaporation jig 13 used to shield one part of a groove 2 as a reference in a composite substrate 7 (composed of a ferrite substrate 1 and of the groove 2 filled with a nonmagnetic material such as glass or the like) is placed on the composite substrate 7; a thin film 8 for marker use is formed by an evaporation operation. Thereby, the thin film 8 for marker use is formed in such a way that one part of the groove 2 is exposed. Since one part of the groove 2 is visible, it is possible to complete a marker 12 which aligns the groove 2 with a marker for photomask use easily and with good accuracy.
申请公布号 JPH02152219(A) 申请公布日期 1990.06.12
申请号 JP19880306349 申请日期 1988.12.02
申请人 FUJITSU LTD 发明人 TSUTSUMI SHOICHI;TAKAHASHI YOSHIO
分类号 G03F9/00;G11B5/31;H01L21/027;H01L21/30 主分类号 G03F9/00
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