| 发明名称 |
RADIATION-SENSITIVE POLYMERS |
| 摘要 |
Disclosed are radiation-sensitive polymers which contain acid-labile groups and onium salt groups with nonnucleophilic counterions in one and the same molecule. These radiations sensitive polymers are highly suitable for use as photoresists and produce the desired resist profiles without additional measures or process steps. They are therefore very advantageously suitable for fabricating semiconductor components.
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| 申请公布号 |
CA2007765(A1) |
申请公布日期 |
1990.07.25 |
| 申请号 |
CA19902007765 |
申请日期 |
1990.01.15 |
| 申请人 |
SCHWALM, REINHOLD;BASF AG |
发明人 |
SCHWALM, REINHOLD;BOETTCHER, ANDREAS |
| 分类号 |
C08F8/00;C08F20/10;C08F20/38;C08F20/52;C08F28/00;C08F30/08;C08F212/14;C08F220/10;C08F220/38;C08F220/58;C08F228/02;C08F230/08;C08F246/00;C08G59/00;C08L63/00;G03F7/039;(IPC1-7):G03F7/039;C08F214/16;G03F7/029 |
主分类号 |
C08F8/00 |
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