发明名称 METHOD FOR MEASURING THICKNESS OF GAMMA-FE2O3 FILM
摘要 <p>PURPOSE:To make it possible to measure the thickness of gamma-Fe2O3 film simply without destruction by measuring infrared-ray reflection spectrum based on the stretching vibration of Fe-O in the gamma-Fe2O3 film which is formed on a substrate that reflects infrared rays. CONSTITUTION:On a substrate, e.g. an Al alloy substrate and the like, which reflects infrared rays, a gamma-Fe2O3 film is formed. Said sample is measured by a reflecting method using infrared-ray spectrophotometer. The thickness of the film is obtained in comparison with a peak area based on the Fe-O bonding in the gamma-Fe2O3 film beforehand. Namely, a calibration curve is formed based on the value which is measured by a probe method accurately once and the value obtained by an infrared-ray spectroscopic method. Thereafter, the film thickness of the sample whose film thickness is unknown is measured only by the infrared-ray spectroscopic method by using the film thickness value i.e. said calibration curve. In the characteristic chart indicating the infrared-ray reflection spectrum of the gamma-Fe2O3 in the figure, the peak area between A and B is obtained when the straight line connecting two points A and B is obtained.</p>
申请公布号 JPH02251712(A) 申请公布日期 1990.10.09
申请号 JP19890074330 申请日期 1989.03.27
申请人 MITSUBISHI ELECTRIC CORP 发明人 SUZUKI SONOKO;INOUE HIROMOTO
分类号 G01B11/06;G01N21/35;G01N21/3563;G11B5/84 主分类号 G01B11/06
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