| 摘要 |
<p>PURPOSE:To reduce the time and cost of a development and allow either one to have the same electric characteristics as well whichever type of a device is developed by making common use of a plurality of photomasks or photomask data in the process in manufacturing of one chip microcomputer with a built-in mask ROM and EPROM. CONSTITUTION:In the process in manufacturing of one chip microcomputers with a built-in mask ROM and EPROM, a plurality of photomasks for photolithography or photomask data are used in common. For example, the form of the mask ROM that is housed in one chip microcomputer with the built-in mask ROM is fitted to a part to be used for one chip microcomputer with the built-in EPROM and further, the layout and sizes of the chip in the mask ROM type and its base circuit structure as well are allowed to have the same configuration as that of the computer with the built-in EPROM. Moreover, in the process of manufacturing, the photomask for photolithography which is used for manufacturing of one chip computer with the built-in EPROM or the photomask date (CAD data and the like) are used in common with the exception of a part of them.</p> |
