| 摘要 |
PURPOSE:To improve the pattern shape in lithography with a KrF excimer laser by using the compsn. prepd. by forming specific bis-(polyhalomethyl)- benzene to a p-vinyl phenol (co)polymer. CONSTITUTION:This compsn. is formed by adding the bis-(polyhalomethyl)- benzene as a photocrosslinking component to a polyvinyl phenol or hydroxy styrene/methyl methacrylate copolymer as a resin component. In the formula, X1 to X3 denote halogen or H; at least one of which is halogen. The more specific example of the formula includes the compd. expressed by formula II. |
