发明名称 METHODS OF PLATING INTO HOLES AND PRODUCTS PRODUCED THEREBY
摘要 <p>In the plating of articles, particularly the filling of via-holes (16) in the manufacture of semiconductor devices, a catalyst, for example palladium, is incorporated throughout the body of material (12) to which plating is to be effected, as compared with activating just the surface of the body.</p>
申请公布号 WO1991008586(A1) 申请公布日期 1991.06.13
申请号 GB1990001869 申请日期 1990.11.30
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