METHOD OF DETERMINING THIN FILM BY X-RAY SPECTROSCOPIC METHOD

摘要

PURPOSE:To allow the successive and approximate determination of the compsn. and thickness of thin films by correcting the concns. of respective component elements in such a manner that calculated X-ray intensity ratios are equal to measured X-ray intensity ratios and repeating simulation. CONSTITUTION:The thin film of a sample is excited by an electron beam of a suitable acceleration voltage and the characteristic X-ray intensities of the component elements are measured. The concns. of the respective component elements of the thin film of the sample are presumed from the ratios of the characteristic X-ray intensities obtd. by exciting the simple standard ample of the component elements. The X-ray intensity ratios of the respective component elements are calculated by simulating the case in which the film thickness is changed by using the presumed concns. of the component elements. Such film thickness at which the calculated values and the actually measured values coincide adequately is presumed. The X-ray intensity ratios are then determined by making simulation calculation at the presumed concns. of the elements of the thin film and the thickness of the thin film and the concns. of the respective component elements are so corrected that the calculated ratios are equal to the measured X-ray intensity ratios. The simulation is repeated by the corrected tentative concns. The compsn. and thickness of the thin film are determined successively and approximately in such a manner.