发明名称 MICROWAVE PLASMA GENERATING APPARATUS AND PROCESS FOR THE PREPARATION OF DIAMOND THIN FILM UTILIZING SAME
摘要 A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means (1,1A,4,5,16,24;3,7) for radiating a plurality of microwaves having different directions of electric fields (Ex,Ey) from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate (14) to be formed thereon with the diamond thin film, the substrate (14) being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.
申请公布号 EP0420117(A3) 申请公布日期 1991.10.09
申请号 EP19900118332 申请日期 1990.09.24
申请人 IDEMITSU PETROCHEMICAL CO. LTD. 发明人 ITATANI, RYOHEI;FUKUMOTO, KAZUYUKI
分类号 B23P5/00;C23C16/26;C23C16/27;C23C16/50;C23C16/511;C30B29/04;H01J37/32;H05H1/46;(IPC1-7):H05H1/46 主分类号 B23P5/00
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