| 摘要 |
PURPOSE:To obtain even flow discharge at a normal gas pressure by a method wherein additional gas injection holes are arranged at a proper interval in the longitudinal direction of a discharge part and additional gas is added in the discharge part through the injection holes. CONSTITUTION:When additional gas, such as Xe gas, Ne gas or the like, is injected in a discharge part 24 through additional gas injection holes 35, which are interconnected to the discharge part 24 and are arranged, an ionization part 35a is formed in the vicinity of each injection hole 35, a remaining part 35b and the like and ionized by electrons, which are fed from the ionization part 35a, and the whole discharge is completed. Accordingly, it is eliminated that microwave discharge concentrates on the vicinity of the entrance of the discharge part 24 and even microwave discharge can be obtained at a normal gas pressure. Moreover, as the ratio of gas, which is added to the feed rate of laser gas, is properly selected, the rate of the Xe gas or the like in the circulating laser medium gas becomes a proper one, an electron density in glow discharge plasma is properly reduced and becomes the optimum one for laser excitation and in addition to these, a discharge impedance is also increased and the constitution of a microwave laser becomes an effective one. |
